# Two-Nanometer Lithography **Entity class:** Semiconductor roadmap concept **Domain:** Semiconductors / Manufacturing **Maturity:** Developed ## Definition Two-nanometer lithography refers to an advanced semiconductor process generation using gate-all-around transistors and increasingly demanding patterning and process control. ## Mechanism and significance The node label is a technology generation, not a guarantee that every physical feature measures exactly two nanometers. ## Relationships - **Research dossier:** [[research/ASI and RSI Timeline Research Moonshots|ASI and RSI Timeline Research Moonshots]] - **Ontology route:** [[ASI and RSI Timeline Ontology#Physical Intelligence and Scientific Infrastructure|Physical Intelligence and Scientific Infrastructure]] - **Primary fields:** [[Physical AI]] · [[AI Infrastructure]] · [[AI Superpower]] - **Adjacent concepts:** [[ASML]] · [[One-Nanometer Lithography]] · [[Computational Substrate]] · [[AI-Designed Semiconductor Supply Chain]] ## Sources and provenance - [[research/ASI and RSI Timeline Research Moonshots|ASI and RSI Timeline Research Moonshots]] — immediate source for this node's role in the broadcast research map. ## Evidence boundary The research dossier establishes why this entity or concept belongs in the Moonshots ontology. Time-sensitive organizational, product, policy, and performance claims should be checked against the linked primary source or a current authoritative source before reuse as settled fact.